Plasma generating device with hairpin-shaped cathode filaments
Patent
·
OSTI ID:863292
- Alamo, CA
A device for generating a homogeneous ion-electron plasma from which a large ion beam can be extracted. The device utilizes hairpin-shaped filaments lining at least portions of the wall of the chamber which have been rotated 90 degrees from prior known approaches. This provides a very significant result in that the DC current flowing through the filaments produces a small solenoidal magnetic field that impedes the emitted electrons from striking the walls of the chamber, which may be of a cylindrical or rectangular configuration. This improves the efficiency of the ion source and provides additional space for more filaments, while providing a very uniform plasma density profile which is noise-free.
- Research Organization:
- Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
- DOE Contract Number:
- W-7405-ENG-48
- Assignee:
- United States of America as represented by United States (Washington, DC)
- Patent Number(s):
- US 4140943
- OSTI ID:
- 863292
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
plasma
generating
device
hairpin-shaped
cathode
filaments
homogeneous
ion-electron
beam
extracted
utilizes
lining
portions
wall
chamber
rotated
90
degrees
prior
approaches
provides
significant
result
dc
current
flowing
produces
solenoidal
magnetic
field
impedes
emitted
electrons
striking
walls
cylindrical
rectangular
configuration
improves
efficiency
source
additional
space
providing
uniform
density
profile
noise-free
provides additional
density profile
plasma density
uniform plasma
device utilizes
magnetic field
current flow
current flowing
dc current
rectangular configuration
plasma generating
shaped cathode
generating device
emitted electrons
/376/313/315/
generating
device
hairpin-shaped
cathode
filaments
homogeneous
ion-electron
beam
extracted
utilizes
lining
portions
wall
chamber
rotated
90
degrees
prior
approaches
provides
significant
result
dc
current
flowing
produces
solenoidal
magnetic
field
impedes
emitted
electrons
striking
walls
cylindrical
rectangular
configuration
improves
efficiency
source
additional
space
providing
uniform
density
profile
noise-free
provides additional
density profile
plasma density
uniform plasma
device utilizes
magnetic field
current flow
current flowing
dc current
rectangular configuration
plasma generating
shaped cathode
generating device
emitted electrons
/376/313/315/