Carbon microstructures for electrochemical studies

Technical Report · Fri Jun 22 00:00:00 EDT 2001

DOI:https://doi.org/10.2172/834265· OSTI ID:834265

Kostecki, Robert; Song, Xiang Yun; Kinoshita, Kim

Thin layers of photoresist were spin coated onto silicon wafers, and then carbonized to form smooth carbon films by heating in nitrogen for 1 hour at temperatures between 600 to 1100 C. Well-defined carbon microstructures on Si wafers that are being considered for electrodes in a microbattery concept were obtained by additional processing steps involving patterning and lithography of the photoresist prior to carbonization. The status of the fabrication of carbon microelectrodes obtained by pyrolysis of photoresist, characterization of the carbons by surface-sensitive techniques and electrochemical analysis by cyclic voltammetry of the I{sup -}/I{sub 3}{sup -} redox reaction is described.

• Research Organization: Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
• Sponsoring Organization: USDOE Director. Office of Science. Office of Basic Energy Sciences. Chemical Sciences Geosciences and Biosciences Division (US)
• DOE Contract Number: AC03-76SF00098
• OSTI ID: 834265
• Report Number(s): LBNL-48364; R&D Project: 474001; TRN: US200432%%180
• Resource Relation: Other Information: PBD: 22 Jun 2001
• Country of Publication: United States
• Language: English

Related Subjects

25 ENERGY STORAGE
CARBON
CARBONIZATION
ELECTRODES
FABRICATION
HEATING
NITROGEN
PROCESSING
PYROLYSIS
REDOX REACTIONS
SILICON
SPIN