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Title: Fabrication of large diameter alumino-silicate K{sup +} sources

Abstract

Alumino-silicate K{sup +} sources have been used in HIF experiments for many years. For example the Neutralized Transport Expt. (NTX) and the High Current Transport Expt. (HCX) are now using this type of ion source with diameters of 2.54 cm and 10 cm respectively. These sources have demonstrated ion currents of 80 mA and 700 mA, for typical HIF pulse lengths of 5-10 {micro}s. The corresponding current density is {approx} 10-15 mA/cm{sup 2}, but much higher current density has been observed using smaller size sources. Recently we have improved our fabrication techniques and, therefore, are able to reliably produce large diameter ion sources with high quality emitter surface without defects. This note provides a detailed description of the procedures employed in the fabrication process. The variables in the processing steps affecting surface quality, such as substrate porosity, powder size distribution, coating technique on large area concave surfaces, drying, and heat firing temperature have been investigated.

Authors:
; ; ;
Publication Date:
Research Org.:
Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
Sponsoring Org.:
USDOE Director. Office of Science. Fusion Energy Sciences (US)
OSTI Identifier:
816775
Report Number(s):
LBNL-51801; HIFAN-1217
R&D Project: Z46010; TRN: US0305137
DOE Contract Number:  
AC03-76SF00098
Resource Type:
Conference
Resource Relation:
Conference: Particle Accelerator Conference, PAC03, Portland, OR (US), 05/12/2003--05/16/2003; Other Information: PBD: 20 Feb 2003
Country of Publication:
United States
Language:
English
Subject:
32 ENERGY CONSERVATION, CONSUMPTION, AND UTILIZATION; 43 PARTICLE ACCELERATORS; ACCELERATORS; COATINGS; CURRENT DENSITY; DEFECTS; DISTRIBUTION; DRYING; FABRICATION; ION SOURCES; POROSITY; PROCESSING; SUBSTRATES; TRANSPORT

Citation Formats

Baca, D, Chacon-Golcher, E, Kwan, J W, and Wu, J K. Fabrication of large diameter alumino-silicate K{sup +} sources. United States: N. p., 2003. Web.
Baca, D, Chacon-Golcher, E, Kwan, J W, & Wu, J K. Fabrication of large diameter alumino-silicate K{sup +} sources. United States.
Baca, D, Chacon-Golcher, E, Kwan, J W, and Wu, J K. 2003. "Fabrication of large diameter alumino-silicate K{sup +} sources". United States. https://www.osti.gov/servlets/purl/816775.
@article{osti_816775,
title = {Fabrication of large diameter alumino-silicate K{sup +} sources},
author = {Baca, D and Chacon-Golcher, E and Kwan, J W and Wu, J K},
abstractNote = {Alumino-silicate K{sup +} sources have been used in HIF experiments for many years. For example the Neutralized Transport Expt. (NTX) and the High Current Transport Expt. (HCX) are now using this type of ion source with diameters of 2.54 cm and 10 cm respectively. These sources have demonstrated ion currents of 80 mA and 700 mA, for typical HIF pulse lengths of 5-10 {micro}s. The corresponding current density is {approx} 10-15 mA/cm{sup 2}, but much higher current density has been observed using smaller size sources. Recently we have improved our fabrication techniques and, therefore, are able to reliably produce large diameter ion sources with high quality emitter surface without defects. This note provides a detailed description of the procedures employed in the fabrication process. The variables in the processing steps affecting surface quality, such as substrate porosity, powder size distribution, coating technique on large area concave surfaces, drying, and heat firing temperature have been investigated.},
doi = {},
url = {https://www.osti.gov/biblio/816775}, journal = {},
number = ,
volume = ,
place = {United States},
year = {Thu Feb 20 00:00:00 EST 2003},
month = {Thu Feb 20 00:00:00 EST 2003}
}

Conference:
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