Bias and self-bias of magnetic macroparticle filters for cathodic arc plasmas
Curved magnetic filters are often used for the removal of macroparticles from cathodic arc plasmas. This study addresses the need to further reduce losses and improving plasma throughput. The central figure of merit is the system coefficient Kappa defined as filtered ion current normalized by the plasma-producing arc current. The coefficient Kappa is investigated as a function of DC and pulsed magnetic field operation, magnetic field strength, external electric bias, and arc amplitude. It increases with positive filter bias but saturates at about 15 V for relatively low magnetic field ({approx}10 mT), whereas stronger magnetic fields lead to higher Kappa with saturation at about 25 V. Further increase of positive bias reduces Kappa. These findings are true for both pulsed and DC filters. Bias of pulsed filters has been realized using the voltage drop across a self-bias resistor, eliminating the need for a separate bias circuit. Almost 100 A of filtered copper ions have been obtained in pulse d mode, corresponding to Kappa approximately equal to 0.04. The results are interpreted by a simplified potential trough model.
- Research Organization:
- Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
- Sponsoring Organization:
- USDOE Assistant Secretary for Energy Efficiency and Renewable Energy. Building Technologies Program; Korean Science and Engineering Foundation (US)
- DOE Contract Number:
- AC03-76SF00098
- OSTI ID:
- 809923
- Report Number(s):
- LBNL-51790; OM-474; JAPIAU; R&D Project: 474716; B& R EC0904000; TRN: US200308%%315
- Journal Information:
- Journal of Applied Physics, Vol. 93, Issue 12; Other Information: Journal Publication Date: June 15, 2003; PBD: 1 Dec 2002; ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
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