Progress in the fabrication of high aspect ratio zone plates by soft x-ray lithography.
Soft x-ray lithography technology has been applied to fabrication of phase shifting Fresnel Zone Plate (FZP's) for hard x-rays. Effects of the exposure conditions, developing system, and electroplating process parameters on line width and aspect ratio have been analyzed. The process has been optimized and an aspect ratio of 11 has been achieved for 110 nm outermost zone width. SEM and AFM have been used for preliminary metrology of the FZPs. The FZP optical performance was characterized at 8 keV photon energy at the 2-ID-D beam line at the Advanced Photon Source. Focusing efficiencies of 23% for FZPs apertures to 100 microns and 18% for 150-micron-diameter apertures have been obtained. The parameters of the fabricated FZP are in good agreement with the predicted values.
- Research Organization:
- Argonne National Lab., IL (US)
- Sponsoring Organization:
- US Department of Energy (US)
- DOE Contract Number:
- W-31-109-ENG-38
- OSTI ID:
- 799808
- Report Number(s):
- ANL/XFD/CP-106519; TRN: US0204857
- Resource Relation:
- Journal Volume: 4783; Conference: SPIE Annual Meeting 2002, Seattle, WA (US), 07/07/2002--07/11/2002; Other Information: PBD: 13 Aug 2002
- Country of Publication:
- United States
- Language:
- English
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