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Title: CF, CF{sub 2} and SiF Densities in Inductively Driven Discharges Containing C{sub 2}F{sub 6}, C{sub 4}F{sub 8} and CHF{sub 3}

Journal Article · · Journal of Applied Physics
OSTI ID:759854

Laser induced fluorescence was used to measure the spatially resolved CF, CF{sub 2} and SiF radical density in inductively driven discharges containing fluorocarbon gases. Measurements of the spatially resolved CF density were performed in C{sub 2}F{sub 6} and CHF{sub 3} containing discharges as functions of inductive power, pressure and bias condition on a silicon substrate. In addition, CF rotational temperatures were calculated, assuming saturated spectra. Measurements of the spatially resolved CF{sub 2} and SiF density were performed in C{sub 4}F{sub 8}, C{sub 2}F{sub 6} and CHF{sub 3} containing discharges as functions of inductive power, pressure and bias condition. SiF rotational temperatures were also estimated. As the induction coil power was increased, the SiF density in the center (r = 0 cm) increased while the CF{sub 2} density decreased and the CF density slightly decreased. In all cases, the radical density in the center of the glow increased with pressure changes from 5 to 30 mTorr while changes in the bias power had little influence on any of the measured radical densities. The spatial distribution of the CF and SiF density peaked in the center of the discharge. The CF{sub 2} density had a local maximum in the center of the plasma with a decreasing density at the edge of the glow. However, the CF{sub 2} density outside the glow region was a factor of 2--6 higher than the density inside the glow region, depending on the gas. CF and SiF rotational temperatures were between 450 and 750 K.

Research Organization:
Sandia National Lab. (SNL-NM), Albuquerque, NM (United States); Sandia National Lab. (SNL-CA), Livermore, CA (United States)
Sponsoring Organization:
US Department of Energy (US)
DOE Contract Number:
AC04-94AL85000
OSTI ID:
759854
Report Number(s):
SAND2000-1489J; TRN: AH200031%%117
Journal Information:
Journal of Applied Physics, Other Information: Submitted to Journal of Applied Physics; PBD: 12 Jun 2000
Country of Publication:
United States
Language:
English

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