Nanostructure of a-Si:H and related alloys by small-angle scattering of neutrons and X-rays: Annual technical progress report: May 22, 1998 -- May 21, 1999
This report describes work being performed to provide details of the microstructure in high-quality hydrogenated amorphous silicon and related alloys on the nanometer scale. The materials under study are being prepared by state-of-the-art deposition methods, as well as by new and emerging deposition techniques. The purpose is to establish the role of nanostructural features in controlling opto-electronic and photovoltaic properties. The approach centers around the use of the uncommon technique of small-angle scattering of both X-rays (SAXS) and neutrons (SANS). SAXS has already been established as highly sensitive to microvoids and columnar-like microstructure. A major goal of this research is to establish the sensitivity of SANS to the hydrogen nanostructure. Conventional X-ray diffraction techniques are being used to examine medium-range order and microcrystallinity, particularly near the boundary between amorphous and microcrystalline material.
- Research Organization:
- National Renewable Energy Lab. (NREL), Golden, CO (United States)
- Sponsoring Organization:
- US Department of Energy (US)
- DOE Contract Number:
- AC36-99GO10337
- OSTI ID:
- 754641
- Report Number(s):
- NREL/SR-520-27664; TRN: AH200012%%26
- Resource Relation:
- Other Information: PBD: 21 Dec 1999
- Country of Publication:
- United States
- Language:
- English
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