Polyester-based thin films with high photosensitivity
A great deal of research has been done to understand the photosensitive optical response of inorganic glasses, which exhibit a permanent, photo-induced refractive index change due to the presence of optically active point defects in the glass structure. In the present work, the authors have performed a preliminary study of the intrinsic photosensitivity of a polyester containing a cinnamylindene malonate group (CPE, a photo- and thermal-crosslinkable group) for use in photonic waveguide devices. Thin films of CPE (approximately 0.5 microns thick) were spun onto fused silica substrates. Optical absorption in the thin films was evaluated both before and after exposure to UV radiation sources. It was found that the polyester exhibits two dominant UV absorption bands centered about 240 nm and 330 nm. Under exposure to 337 nm radiation (nitrogen laser) a marked bleaching of the 330 nm band was observed. This band bleaching is a direct result of the photo-induced crosslinking in the cinnamylindene malonate group. Exposure to 248 nm radiation (excimer laser), conversely, resulted in similar bleaching of the 330 nm band but was accompanied by nearly complete bleaching of the higher energy 240 nm band. Based on a Kramers-Kronig analysis of the absorption changes, refractive index changes on the order of {minus}10{sup {minus}2} are estimated. Confirmation of this calculation has been provided via ellipsometry which estimates a refractive index change at 632 nm of {minus}0.061 {+-} 0.002. Thus, the results of this investigation confirm the photosensitive potential of this type of material.
- Research Organization:
- Sandia National Lab. (SNL-NM), Albuquerque, NM (United States); Sandia National Lab. (SNL-CA), Livermore, CA (United States)
- Sponsoring Organization:
- US Department of Energy (US)
- DOE Contract Number:
- AC04-94AL85000
- OSTI ID:
- 752102
- Report Number(s):
- SAND99-2970C; TRN: AH200018%%157
- Resource Relation:
- Conference: SPIE Opto Southwest 2000, Albuquerque, NM (US), 04/10/2000--04/11/2000; Other Information: PBD: 29 Feb 2000
- Country of Publication:
- United States
- Language:
- English
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