Laser techniques for studying chemical vapor deposition
Chemical vapor deposition (CVD) is widely used to produce thin films for microelectronics, protective coatings and other materials processing applications. Despite the large number of applications, however, little is known about the fundamental chemistry and physics of most CVD processes. CVD recipes have generally been determined empirically, but as process requirements become more stringent, a more basic understanding will be needed to improve reactor design and speed process optimization. In situ measurements of the reacting gas are important steps toward gaining such an understanding, both from the standpoint of characterizing the reactor and testing models of a CVD process. Our work, a coordinated program of experimental and theoretical research in the fundamental mechanisms of CVD, illustrates the application of laser techniques to the understanding of a CVD system. We have used a number of laser-based techniques to probe CVD systems and have compared our measurements with predictions from computer models, primarily for the silane CVD system. The silane CVD model solves the two-dimensional, steady-state boundary layer equations of fluid flow coupled to 26 elementary chemical reactions describing the thermal decomposition of silane and the subsequent reactions of intermediate species that result in the deposition of a silicon film.
- Research Organization:
- Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
- Sponsoring Organization:
- DOE/ER
- DOE Contract Number:
- AC04-76DP00789
- OSTI ID:
- 7155803
- Report Number(s):
- SAND-89-2860C; CONF-900656-2; ON: DE90012921
- Resource Relation:
- Journal Volume: 1318; Conference: Meeting on optical spectroscopic instrumentation and techniques for the 1990s: applications in astronomy, chemistry and physics, Las Cruces, NM (USA), 4-6 Jun 1990
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
CHEMICAL VAPOR DEPOSITION
MONITORING
SILANES
FLUORESCENCE
GASES
LASERS
RAMAN SPECTRA
CHEMICAL COATING
DEPOSITION
FLUIDS
HYDRIDES
HYDROGEN COMPOUNDS
LUMINESCENCE
ORGANIC COMPOUNDS
ORGANIC SILICON COMPOUNDS
SILICON COMPOUNDS
SPECTRA
SURFACE COATING
360201* - Ceramics
Cermets
& Refractories- Preparation & Fabrication