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Title: Continuous Czochralski process development. LSSA Large Area Silicon Sheet Task. Quarterly report No. 3, April--June 1978

Technical Report ·
DOI:https://doi.org/10.2172/6866589· OSTI ID:6866589

A Czochralski crystal growing furnace is being set up to permit installation of a continuous molten silicon feed apparatus. Numerous modifications have been designed and constructed to convert a Varian 2898A furnace to a continuous mode of operation. New laboratory facilities to house the continuous furnace were prepared and assembly of the furnace has been completed. Furnace checkout will be carried out early in the next quarter. Economic modeling of the continuous Czochralski process has continued utilizing the IPEG option of SAMICS. The influence of both crystal size and total furnace run size have been examined. Results of these studies indicate that for 10-cm diameter crystal, 100-kg furnace runs of four or five crystals each are near-optimal. Costs tend to asymptote at the 100-kg level so little additional cost improvement occurs at larger runs. For these conditions, crystal cost in equivalent wafer area of around $20/m/sup 2/ exclusive of polysilicon and slicing is obtained.

Research Organization:
Texas Instruments, Inc., Dallas, TX (United States)
Sponsoring Organization:
USDOE
DOE Contract Number:
NAS-7-100-954887
OSTI ID:
6866589
Report Number(s):
DOE/JPL/954887-3
Country of Publication:
United States
Language:
English