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Title: Development of high efficiency, low cost ZnSiAs/sub 2/ solar cells. Quarterly technical progress report No. 4, January 1, 1980-March 31, 1980

Technical Report ·
DOI:https://doi.org/10.2172/6668268· OSTI ID:6668268

The p-ZnSiAs/sub 2//n-GaAs structures fabricated earlier were analyzed using the Electron Beam Induced Current technique and were found to have a diffused p-n junction in the GaAs. The short circuit current density associated with this structure was found to be a factor of 2 to 3 lower than predicted when analyzed as a ZnSiAs/sub 2//GaAs heteroface structure (the ZnSiAs/sub 2/ was assumed to behave as a window layer). Epitaxial growth has now been demonstrated for two additional substrates, Si and ..cap alpha..-Al/sub 2/O/sub 3/. In the case of Si, it was necessary to first grow a Si epi-layer followed by ZnSiAs/sub 2/ growth. Heretofore, epitaxial growth of ZnSiAs/sub 2/ has only been reported on Ge and GaAs substrates. n-ZnSiAs/sub 2//p-Si structures have been fabricated which exhibit photovoltaic behavior. It is not clear yet whether the photovoltaic behavior is due to a diffused junction in the Si or is indicative of a true heterostructure behavior. ZnSiAs/sub 2/ p-n junction formation continues to be investigated but as yet has not resulted in junction behavior.

Research Organization:
RTI International, Durham, NC (United States)
Sponsoring Organization:
USDOE
DOE Contract Number:
AC04-79ET23001
OSTI ID:
6668268
Report Number(s):
COO-3001-4
Country of Publication:
United States
Language:
English