Method of sputter etching a surface
Patent
·
OSTI ID:6666896
A surface is textured by co-sputter etching with a target and a seed material with the surface at a pre-selected temperature. By pre-selecting the temperature of the surface while sputter etching, it is possible to predetermine the reflectance properties of the etched surface. The surface may be textured to absorb sunlight efficiently and have minimal emittance in the infrared region so as to be well-suited for use as a solar absorber for photothermal energy conversion.
- DOE Contract Number:
- AC06-76RL01830
- Assignee:
- Dept. of Energy
- Patent Number(s):
- PATENTS-US-A352738
- Application Number:
- ON: DE83002406
- OSTI ID:
- 6666896
- Country of Publication:
- United States
- Language:
- English
Similar Records
Method of sputter etching a surface
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Method of sputter etching a surface
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Tue Feb 14 00:00:00 EST 1984
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Cylindrical magnetron co-sputter etching of copper with applications for solar selective absorbing surfaces
Journal Article
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Wed Jul 01 00:00:00 EDT 1981
· J. Vac. Sci. Technol.; (United States)
·
OSTI ID:6666896
Related Subjects
14 SOLAR ENERGY
SOLAR ABSORBERS
ETCHING
SPUTTERING
SPECTRALLY SELECTIVE SURFACES
ABSORPTIVITY
EMISSIVITY
ROUGHNESS
SPECTRAL REFLECTANCE
TEMPERATURE EFFECTS
EQUIPMENT
OPTICAL PROPERTIES
PHYSICAL PROPERTIES
SOLAR EQUIPMENT
SURFACE FINISHING
SURFACE PROPERTIES
SURFACES
141000* - Solar Collectors & Concentrators
SOLAR ABSORBERS
ETCHING
SPUTTERING
SPECTRALLY SELECTIVE SURFACES
ABSORPTIVITY
EMISSIVITY
ROUGHNESS
SPECTRAL REFLECTANCE
TEMPERATURE EFFECTS
EQUIPMENT
OPTICAL PROPERTIES
PHYSICAL PROPERTIES
SOLAR EQUIPMENT
SURFACE FINISHING
SURFACE PROPERTIES
SURFACES
141000* - Solar Collectors & Concentrators