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Title: Irradiation-induced segregation in Ni--Si alloys. [525/sup 0/C with 3 MeV /sup 58/Ni/sup +/ ions]

Conference ·
OSTI ID:6652387

Radiation-induced segregation was studied in an Ni-1 at. % Si alloy after irradiation at a temperature of approximately 525/sup 0/C with 3-MeV /sup 58/Ni/sup +/ ions. Profiles of alloy composition as a function of depth from the irradiated surface were obtained by standard Auger techniques and ion-sputtering at room temperature. Rapid segregation of Si toward the irradiated surface was observed. The solubility limit of Si in Ni was reached at the surface after a dose of only 0.05 dpa. Segregation continued to increase up to the highest dose (6.5 dpa) which was investigated. Precipitation of Ni/sub 3/Si occurred at the external surface and internally on dislocation loops. The experimental results are compared with calculations using the Johnson-Lam segregation model and a set of parameters that was used previously to fit the temperature dependence of radiation-induced segregation in Ni-1 at. % Si.

Research Organization:
Argonne National Lab., IL (USA)
Sponsoring Organization:
USDOE
DOE Contract Number:
W-31-109-ENG-38
OSTI ID:
6652387
Report Number(s):
CONF-780722-12; TRN: 78-019873
Resource Relation:
Conference: 9. symposium on effects of radiation in structural materials, Richland, WA, USA, 10 Jul 1978
Country of Publication:
United States
Language:
English