Concurrent design of an RTP chamber and advanced control system
Conference
·
OSTI ID:663246
- Sandia National Labs., Livermore, CA (United States)
- Microelectronics Control and Sensing, Inc., Mountain View, CA (United States)
- CVC Products, Inc., Fremont, CA (United States)
A concurrent-engineering approach is applied to the development of an axisymmetric rapid-thermal-processing (RTP) reactor and its associated temperature controller. Using a detailed finite-element thermal model as a surrogate for actual hardware, the authors have developed and tested a multi-input multi-output (MIMO) controller. Closed-loop simulations are performed by linking the control algorithm with the finite-element code. Simulations show that good temperature uniformity is maintained on the wafer during both steady and transient conditions. A numerical study shows the effect of ramp rate, feedback gain, sensor placement, and wafer-emissivity patterns on system performance.
- Research Organization:
- Sandia National Lab. (SNL-CA), Livermore, CA (United States)
- Sponsoring Organization:
- USDOE Assistant Secretary for Human Resources and Administration, Washington, DC (United States)
- DOE Contract Number:
- AC04-94AL85000
- OSTI ID:
- 663246
- Report Number(s):
- SAND-95-8580C; CONF-950412-; ON: DE98006446; TRN: AHC29818%%78
- Resource Relation:
- Conference: Spring meeting of the Materials Research Society (MRS), San Francisco, CA (United States), 17-21 Apr 1995; Other Information: PBD: [1995]
- Country of Publication:
- United States
- Language:
- English
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