Wafer-scale laser lithography. I. Pyrolytic deposition of metal microstructures. [For ultra-large scale integrated circuits]

Conference · Fri Jan 01 00:00:00 EST 1982

OSTI ID:6574498

Herman, I P; Hyde, R A; McWilliams, B M; Weisberg, A H; Wood, L L

Mechanisms for laser-driven pyrolytic deposition of micron-scale metal structures on crystalline silicon have been studied. Models have been developed to predict temporal and spatial propeties of laser-induced pyrolytic deposition processes. An argon ion laser-based apparatus has been used to deposit metal by pyrolytic decomposition of metal alkyl and carbonyl compounds, in order to evaluate the models. These results of these studies are discussed, along with their implications for the high-speed creation of micron-scale metal structures in ultra-large scale integrated circuit systems. 4 figures.

• Research Organization: Lawrence Livermore National Lab., CA (USA)
• DOE Contract Number: W-7405-ENG-48
• OSTI ID: 6574498
• Report Number(s): UCRL-88314; CONF-821107-37; ON: DE83004220
• Resource Relation: Conference: 6. international symposium on the scientific basis for radioactive waste management, Boston, MA, USA, 1 Nov 1982
• Country of Publication: United States
• Language: English

Related Subjects

42 ENGINEERING
INTEGRATED CIRCUITS
FABRICATION
NICKEL
CHEMICAL VAPOR DEPOSITION
KINETICS
LASER-RADIATION HEATING
METALS
PYROLYSIS
SEMICONDUCTOR DEVICES
SILICON
CHEMICAL COATING
CHEMICAL REACTIONS
DECOMPOSITION
DEPOSITION
ELECTRONIC CIRCUITS
ELEMENTS
HEATING
MICROELECTRONIC CIRCUITS
PLASMA HEATING
SEMIMETALS
SURFACE COATING
THERMOCHEMICAL PROCESSES
TRANSITION ELEMENTS
420800* - Engineering- Electronic Circuits & Devices- (-1989)