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Title: Instability of compensated beam-beam collisions

Conference ·
OSTI ID:6360445

The beam-beam disruption phenomena in linear colliders are increasingly seen as a source of serious problems for these machines. A plasma compensation scheme, in which the motion of the plasma electrons in the presence of the colliding beams provides neutralizing charge and current densities, has been proposed and studied. But natural alternative to this scheme is to consider the overlapping of nearly identical high energy e/sup +/ and e/sup /minus// bunches, and the collision of two such pairs - in other words, collision of two opposing relativistic positronium plasmas. It should be noticed that while the luminosity for all collisions is increased by a factor of four in this scheme, the event rate for e/sup +/e/sup /minus// collisions is only increased by a factor of two. The other factor of two corresponds to the addition of e/sup +/e/sup +/ and e/sup /minus//e/sup /minus// collisions to the interaction point. This beam compensation scheme, which has been examined through computer simulation by Balakin and Solyak in the Soviet Union, promises full neutralization of beam charges and currents. These numerical investigations have shown that plasma instabilities exist in this nominally neutral system. Although the implementation of this idea seems technically daunting, the potential benefits (beamstrahlung and disruption suppression, relaxation of final focus system constraints) are such that we should consider the physics of these collisions further. In the remainder of this paper, we theoretically analyze the issues of stability and bunch parameter tolerances in this scheme. 11 refs.

Research Organization:
Argonne National Lab., IL (USA)
DOE Contract Number:
W-31109-ENG-38; AC03-76SF00098; AC03-76SF00515
OSTI ID:
6360445
Report Number(s):
ANL-HEP-CP-89-13; CONF-890197-3; ON: DE89009818
Resource Relation:
Conference: Advanced accelerator concepts workshop, Lake Arrowhead, CA, USA, 9 Jan 1989; Other Information: Portions of this document are illegible in microfiche products
Country of Publication:
United States
Language:
English