Efficient polishing of aspheric optics
The objectives of this project are to develop, evaluate, and optimize novel designs for a polishing tool intended for ultra-precise figure corrections on aspheric optics with tolerances typical of those required for use in extreme ultraviolet (EUV) projection lithography. This work may lead to an enhanced US industrial capability for producing optics for EUV, x-ray and, other high precision applications. LLNL benefits from developments in computer-controlled polishing and the insertion of fluid mechanics modeling into the precision manufacturing area. Our accomplishments include the numerical estimation of the hydrodynamic shear stress distribution for a new polishing tool that directs and controls the interaction of an abrasive slurry with an optical surface. A key milestone is in establishing a correlation between the shear stress predicted using our fluid mechanics model and the observed removal footprint created by a prototype tool. In addition, we demonstrate the ability to remove 25 nm layers of optical glass in a manner qualitatively similar to macroscopic milling operations using a numerically- controlled machine tool. Other accomplishments include the development of computer control software for directing the polishing tool and the construction of a polishing testbed.
- Research Organization:
- Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
- Sponsoring Organization:
- USDOE, Washington, DC (United States)
- DOE Contract Number:
- W-7405-ENG-48
- OSTI ID:
- 591787
- Report Number(s):
- UCRL-ID-127008; R&D Project: 94-ERP-068; ON: DE98051054
- Resource Relation:
- Other Information: PBD: 15 Apr 1997
- Country of Publication:
- United States
- Language:
- English
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