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Title: Analysis of DC magnetron sputtered beryllium films

Conference ·
OSTI ID:5914880

We are evaluating techniques that alter the columnar grain structure in sputtered beryllium films on fused silica substrates. The films are formed by DC magnetron sputtering, and the columnar structure, which is characteristic of this and most other deposition techniques, is highly detrimental to the tensile strength of the films. Attempts to modify the columnar structure by using RF-biased sputtering combined with nitrogen pulsing have been successful, and this paper describes the analyses of these films. Sputtered beryllium films are quite brittle, and the columnar structure in particular tends to form a distinct intergranular fracture; therefore, the grain structure was analyzed in fractured specimens using the high-resolution capability of a scanning electron microscope (SEM) equipped with a field emission gun (FESEM). Ion microanalysis using secondary-ion mass spectroscopy (SIMS) was conducted on some specimens to determining relative contamination levels introduced by nitrogen pulsing. The capability to perform quantitative SIMS analyses using ion-implanted specimens as standards also is being developed. This work confirms that the structure of DC magnetron sputtered beryllium can be improved significantly with combined nitrogen pulsing and RF-biased sputtering. 8 refs.

Research Organization:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
DOE Contract Number:
W-7405-ENG-48
OSTI ID:
5914880
Report Number(s):
UCRL-99314; CONF-8810401-1; ON: DE89015727
Resource Relation:
Conference: High power laser optical components topical meeting, Boulder, CO, USA, 24-25 Oct 1988; Other Information: Portions of this document are illegible in microfiche products
Country of Publication:
United States
Language:
English