vuv synchrotron light as a technique for studying the interface quality and properties of thin overlayers

Conference · Sat Dec 01 00:00:00 EST 1984

OSTI ID:5771658

Ruckman, M W; Murgai, V; Strongin, M

The measurements presented here show the value of synchrotron light for determining both the electronic structure of overlayers, and the physical nature of the overlayer-substrate interface. A comparison is given between deposited layers and thermally stabilized layers. Estimates are also made of the bonding energy between the overlayer and substrate.

• Research Organization: Brookhaven National Lab., Upton, NY (USA)
• DOE Contract Number: AC02-76CH00016
• OSTI ID: 5771658
• Report Number(s): BNL-35988; CONF-841157-88; ON: DE85009822
• Resource Relation: Conference: Materials Research Society annual meeting, Boston, MA, USA, 26 Nov 1984; Other Information: Portions of this document are illegible in microfiche products
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
NICKEL
ELECTRONIC STRUCTURE
SPECTRA
PALLADIUM
TANTALUM
THIN FILMS
ADHESION
BINDING ENERGY
ENERGY LEVELS
INTERFACES
LAYERS
SYNCHROTRON RADIATION
VALENCE
BREMSSTRAHLUNG
ELECTROMAGNETIC RADIATION
ELEMENTS
ENERGY
FILMS
METALS
PLATINUM METALS
RADIATIONS
TRANSITION ELEMENTS
360104* - Metals & Alloys- Physical Properties