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Title: Electrical properties of neutron-transmutation-doped germanium

Technical Report ·
DOI:https://doi.org/10.2172/5770973· OSTI ID:5770973

Electrical properties of neutron-transmutation-doped germanium (NTD Ge) and nearly uncompensated gallium-doped germanium have been measured as functions of net-impurity concentration (2 x 10/sup 15/cm/sup -3/ less than or equal to N/sub A/ - N/sub D/ less than or equal to 5 x 10/sup 16/cm/sup -3/) and temperature (0.3 K less than or equal to T less than or equal to 300 K). The method of impurity conduction as a function of carrier concentration and compensation was investigated in the low temperature hopping regime. For nearest neighbor hopping, the resistivity is expected to vary as rho = rho/sub 0/exp(..delta../T) while Mott's theory of variable range hopping predicts that rho = rho/sub 0/exp(..delta../T)/sup 1/4/ in the low temperature limit. In contrast, our results show that the resistivity can best be approximated by rho = rho/sub 0/exp(..delta../T)/sup 1/2/ in the hopping regime down to 0.3 K.

Research Organization:
Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
DOE Contract Number:
AC03-76SF00098
OSTI ID:
5770973
Report Number(s):
LBL-16216; ON: DE83016693
Resource Relation:
Other Information: Thesis
Country of Publication:
United States
Language:
English