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Title: Low-pressure ion source

Patent ·
OSTI ID:5693339

A low pressure ion source for a neutron source comprises a filament cathode and an anode ring. Approximately 150V is applied between the cathode and the anode. Other electrodes, including a heat shield, a reflector and an aperture plate with a focus electrode, are placed at intermediate potentials. Electrons from the filament drawn out by the plasma and eventually removed by the anode are contained in a magnetic field created by a magnet ring. Ions are formed by electron impact with deuterium or tritium and are extracted at the aperture in the focus electrode. The ion source will typically generate a 200 mA beam through a 1.25 cm/sup 2/ aperture for an arc current of 10A. For deuterium gas, the ion beam is over 50 percent D/sup +/ with less than 1% impurity. The current density profile across the aperture will typically be uniform to within 20%.

DOE Contract Number:
AC04-76DP00789
Assignee:
SNL; ERA-08-055119; EDB-83-180999
Application Number:
ON: DE83018008
OSTI ID:
5693339
Country of Publication:
United States
Language:
English