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Title: (Evaluation of the high intensity plasma sputer negative ion source and to test the response of the University of Tsukuba 13-MV tandem accelerator to mA intensity level pulsed mode heavy negative ion beams)

Technical Report ·
DOI:https://doi.org/10.2172/5652338· OSTI ID:5652338

A working visit was made to the National Laboratory for High Energy Physics, Tsukuba, Japan, during the time periods May 16, 1988--June 15, 1988 for the purposes of further evaluation of the high intensity plasma sputter negative ion source and to test the response of the University of Tsukuba 13-MV tandem accelerator to mA intensity level pulsed mode heavy negative ion beams. During the visit, the traveler worked in collaboration with Japanese scientists in installing and testing of the source on the University of Tsukuba tandem electrostatic accelerator injector. During the course of preliminary testing of the ion source and prior to actual injection into the accelerator, sparking began in one or more tube sections, which ultimately led to the decision to replace the damaged tube sections. This problem led to postponement of the scheduled tandem accelerator tests. The traveler attended the Seventh International Conference on Ion Implantation Technology held in the International Conference Hall, Kyoto, Japan, on June 5-11, 1988, where he chaired a session on ion sources and presented an invited paper entitled The Sputter Generation of High Intensity Negative Ion Beams.'' Following the conference, the traveler was invited to visit the Institute for Nuclear Study, the University of Tokyo, Tanashi-shi, Japan, for the purpose of presenting a seminar entitled A High Intensity Plasma Sputter Negative Ion Source: Formation Mechanisms and Performance.'' This report summarized the pertinent information and impressions gained during these visits.

Research Organization:
Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
Sponsoring Organization:
DOE/ER
DOE Contract Number:
AC05-84OR21400
OSTI ID:
5652338
Report Number(s):
ORNL/FTR-2927; ON: DE89017493
Country of Publication:
United States
Language:
English

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