Installation of Multiple Application X-ray Imaging Undulator Microscope (MAXIMUM) at ALS: Final report, 8/15/95-8/15/96
MAXIMUM is short for Multiple Application X-ray IMaging Undulator Microscope, a project started in 1988 by our group at the Synchrotron Radiation Center of the University of Wisconsin-Madison. It is a scanning x-ray photoemission microscope that uses a multilayer-coated Schwarzschild objective as the focusing element. It was designed primarily for materials science studies of lateral variations in surface chemistry. Suitable problems include: lateral inhomogeneities in Schottky barrier formation, heterojunction formation, patterned samples and devices, insulating samples. Any system which has interesting properties that are not uniform as a function of spatial dimension can potentially be studied with MAXIMUM. 6 figs., 3 tabs.
- Research Organization:
- Univ. of Wisconsin, Madison, WI (United States)
- Sponsoring Organization:
- USDOE Office of Energy Research, Washington, DC (United States)
- DOE Contract Number:
- FG02-95ER45547
- OSTI ID:
- 486588
- Report Number(s):
- DOE/ER/45547-T1; ON: DE97003637
- Resource Relation:
- Other Information: PBD: 1996
- Country of Publication:
- United States
- Language:
- English
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