A study of material removal during magnetorheological finishing. 1998 summer research program for high school juniors at the Univ. of Rochester`s Laboratory for Laser Energetics: Student research reports
- Pittsford Sutherland High School, NY (United States)
In the process of optical polishing, a new method has been developed called Magnetorheological Finishing, or MRF. This process utilizes both mechanical and chemical effects to remove material during polishing. To more fully understand the fundamental mechanisms of MR polishing the authors have successfully separated mechanical scratching from chemical softening in glass polishing with MRF by removing the water from the MR fluid. The addition of water initiates the chemical effects by hydrating the glass surface and changing the amplitude of the scratches. In addition, this study has found that the mechanical removal by scratching is related to the hardness of the magnetic carbonyl iron particles, and the hardness and type of the glass being polished.
- Research Organization:
- Univ. of Rochester, Lab. for Laser Energetics, NY (United States)
- Sponsoring Organization:
- USDOE, Washington, DC (United States)
- DOE Contract Number:
- FC03-92SF19460
- OSTI ID:
- 362524
- Report Number(s):
- DOE/SF/19460-299-Pt.3; ON: DE99003383; TRN: AHC29926%%179
- Resource Relation:
- Other Information: PBD: Mar 1999
- Country of Publication:
- United States
- Language:
- English
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