Patch diameter limits for tiered subaperture SAR image formation algorithms
Synthetic Aperture Radar image formation algorithms typically use transform techniques that often requires trading between image resolution, algorithm efficiency, and focussed image scene size limits. This is due to assumptions for the data such as simplified (often straight-line) flight paths, simplified imaging geometry, and simplified models for phase functions. Many errors in such assumptions are typically untreatable due to their dependence on both data domain positions and image domain positions. The result is that large scenes often require inefficient multiple image formation iterations, followed by a mosaicking operation of the focussed image patches. One class of image formation algorithms that performs favorably divides the spatial and frequency apertures into subapertures, and perhaps those subapertures into sub-subapertures, and so on, in a tiered subaperture fashion. This allows a gradual shift from data domain into image domain that allows correcting many types of errors that limit other image formation algorithms, even in a dynamic motion environment, thereby allowing larger focussed image patches without mosaicking. This paper presents and compares focussed patch diameter limits for tiered subaperture (TSA) image formation algorithms, for various numbers of tiers of subapertures. Examples are given that show orders-of-magnitude improvement in non-mosaicked focussed image patch size over traditional polar format processing, and that patch size limits increase with the number of tiers of subapertures, although with diminishing returns.
- Research Organization:
- Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
- Sponsoring Organization:
- USDOE, Washington, DC (United States)
- DOE Contract Number:
- AC04-94AL85000
- OSTI ID:
- 33131
- Report Number(s):
- SAND-94-2451C; CONF-950472-3; ON: DE95008816
- Resource Relation:
- Conference: SPIE international symposium on aerospace/defense sensing and dual-use photonics, Orlando, FL (United States), 17-21 Apr 1995; Other Information: PBD: [1994]
- Country of Publication:
- United States
- Language:
- English
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