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Title: Recent progress in GaInAsSb thermophotovoltaics grown by organometallic vapor phase epitaxy

Technical Report ·
DOI:https://doi.org/10.2172/307841· OSTI ID:307841
; ;  [1];  [2]
  1. Massachusetts Inst. of Tech., Lexington, MA (United States). Lincoln Lab.
  2. Lockheed Martin, Inc., Schenectady, NY (United States)

Studies on the materials development of Ga{sub 1{minus}x}In{sub x}As{sub y}Sb{sub 1{minus}y} alloys for thermophotovoltaic (TPV) devices are reviewed. Ga{sub 1{minus}x}In{sub x}As{sub y}Sb{sub 1{minus}y} epilayers were grown lattice matched to GaSb substrates by organometallic vapor phase epitaxy (OMVPE) using all organometallic precursors including triethylgallium, trimethylindium, tertiarybutylarsine, and trimethylantimony with diethyltellurium and dimethylzinc as the n- and p-type dopants, respectively. The overall material quality of these alloys depends on growth temperature, In content, V/III ratio, substrate misorientation, and to a lesser extent, growth rate. A mirror-like surface morphology and room temperature photoluminescence (PL) are obtained for GaInAsSb layers with peak emission in the wavelength range between 2 and 2.5 {micro}m. The crystal quality improves for growth temperature decreasing from 575 to 525 C, and with decreasing In content, as based on epilayer surface morphology and low temperature PL spectra. A trend of smaller full width at half-maximum for low temperature PL spectra is observed as the growth rate is increased from 1.5 to 2.5 and 5 {micro}m/h. In general, GaInAsSb layers grown on (100) GaSb substrates with a 6{degree} toward (111)B misorientation exhibited overall better material quality than layers grown on the more standard substrate (100)2{degree} toward (110). Consistent growth of high performance lattice-matched GaInAsSb TPV devices is also demonstrated.

Research Organization:
Knolls Atomic Power Lab. (KAPL), Niskayuna, NY (United States)
Sponsoring Organization:
USDOE Assistant Secretary for Nuclear Energy, Washington, DC (United States)
DOE Contract Number:
AC12-76SN00052
OSTI ID:
307841
Report Number(s):
KAPL-P-000082; K-98072; CONF-9805146-; ON: DE99001573; TRN: AHC29905%%18
Resource Relation:
Conference: 9. international conference on MOVPE, La Jolla, CA (United States), 30 May - 4 Jun 1998; Other Information: PBD: Jun 1998
Country of Publication:
United States
Language:
English