Industrial process driven system requirements for PSII applications

Conference · Wed Oct 01 00:00:00 EDT 1997

OSTI ID:292866

Munson, C P

Plasma Source Ion Implantation (PSII) is a room temperature, plasma-based surface enhancement technology which is being commercialized through the efforts of a group of companies. A number of issues are critical to the successful design and operation of a commercial PSII system. These include overall vacuum system design, plasma source requirements and plasma-target interaction considerations, pulsed, high voltage sub-system (typically referred to as modulator) requirements, and target requirements and limitations. Critical system components are outlined and overall system design will be briefly covered.

• Research Organization: Los Alamos National Lab. (LANL), Los Alamos, NM (United States)
• Sponsoring Organization: Department of Commerce, Washington, DC (United States); National Inst. of Standards and Technology, Gaithersburg, MD (United States)
• DOE Contract Number: W-7405-ENG-36
• OSTI ID: 292866
• Report Number(s): LA-UR-97-4067; CONF-9710151-; ON: DE98003008; TRN: AHC2DT08%%47
• Resource Relation: Conference: ATP Motor Vehicle Manufacturing Technology (MVMT) conference, Ann Arbor, MI (United States), 28-29 Oct 1997; Other Information: PBD: Oct 1997
• Country of Publication: United States
• Language: English

Related Subjects

32 ENERGY CONSERVATION, CONSUMPTION, AND UTILIZATION
29 ENERGY PLANNING AND POLICY
ION IMPLANTATION
SURFACE TREATMENTS
COMMERCIALIZATION
PLASMA PRODUCTION
SERVICE LIFE
VACUUM SYSTEMS
DESIGN
POWER SUPPLIES
SPECIFICATIONS