Industrial process driven system requirements for PSII applications
Conference
·
OSTI ID:292866
Plasma Source Ion Implantation (PSII) is a room temperature, plasma-based surface enhancement technology which is being commercialized through the efforts of a group of companies. A number of issues are critical to the successful design and operation of a commercial PSII system. These include overall vacuum system design, plasma source requirements and plasma-target interaction considerations, pulsed, high voltage sub-system (typically referred to as modulator) requirements, and target requirements and limitations. Critical system components are outlined and overall system design will be briefly covered.
- Research Organization:
- Los Alamos National Lab. (LANL), Los Alamos, NM (United States)
- Sponsoring Organization:
- Department of Commerce, Washington, DC (United States); National Inst. of Standards and Technology, Gaithersburg, MD (United States)
- DOE Contract Number:
- W-7405-ENG-36
- OSTI ID:
- 292866
- Report Number(s):
- LA-UR-97-4067; CONF-9710151-; ON: DE98003008; TRN: AHC2DT08%%47
- Resource Relation:
- Conference: ATP Motor Vehicle Manufacturing Technology (MVMT) conference, Ann Arbor, MI (United States), 28-29 Oct 1997; Other Information: PBD: Oct 1997
- Country of Publication:
- United States
- Language:
- English
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