Quartz substrates for EUVL reticles
Conference
·
OSTI ID:192529
- Lawrence Livermore National Lab., CA (United States)
- Hoya Micro Mask, Hoya (United States)
A EUVL reticle blank was fabricated on a specially polished quartz blank. The stress-induced distortion of the multilayer coating was unacceptably large. The distortion can be effectively eliminated by coating the backside of the reticle blank with an identical coating. This strategy has the potential to eliminate multilayer induced stress distortion for the reticle blank in a manner which is compatible with the existing reticle fabrication infrastructure.
- Research Organization:
- Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
- Sponsoring Organization:
- USDOE, Washington, DC (United States)
- DOE Contract Number:
- W-7405-ENG-48
- OSTI ID:
- 192529
- Report Number(s):
- UCRL-JC-119907; CONF-9409177-17; ON: DE96004654
- Resource Relation:
- Conference: Optical Society of America conference on extreme ultraviolet lithography, Monterey, CA (United States), 19-21 Sep 1994; Other Information: PBD: 10 Feb 1995
- Country of Publication:
- United States
- Language:
- English
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