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Title: System and method for repeated metal deposition-dewetting steps to form a nano-particle etching mask producing thicker layer of engraved metasurface

Patent ·
OSTI ID:1892796
; ;

A method and system is disclosed for creating an optical component having a spatially controlled refractive index and uniform anti-reflective layer. The method may involve alternately depositing and dewetting two or more thin metal material layers on the substrate to form a mask having a spatially varying nano-particle distribution, and with an increased thickness beyond what could be achieved using a single, thick layer of the same material. The substrate may then be etched, using the mask, to imprint a spatially patterned nanostructure pattern on a surface the substrate in accordance with the mask.

Research Organization:
Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
Sponsoring Organization:
USDOE
DOE Contract Number:
AC52-07NA27344
Assignee:
Lawrence Livermore National Security, LLC (Livermore, CA)
Patent Number(s):
11,294,103
Application Number:
16/875,337
OSTI ID:
1892796
Resource Relation:
Patent File Date: 05/15/2020
Country of Publication:
United States
Language:
English

References (18)

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Crystallographically-Oriented Metallic Films with Two-Dimensional Crystal Layers patent-application August 2020
Nanostructures Layer for Graded Index Freeform Optics patent-application December 2018
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Plasmonic Optical Fiber Sensor Based on Double Step Growth of Gold Nano-Islands journal April 2018
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