Response Speed of Negative Capacitance FinFETs
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conference
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June 2018 |
Quantifying non-centrosymmetric orthorhombic phase fraction in 10 nm ferroelectric Hf 0.5 Zr 0.5 O 2 films
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journal
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December 2020 |
A key piece of the ferroelectric hafnia puzzle
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journal
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September 2020 |
On the scaling of subnanometer EOT gate dielectrics for ultimate nano CMOS technology
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journal
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April 2015 |
Unveiling the double-well energy landscape in a ferroelectric layer
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journal
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January 2019 |
A Thermodynamic Approach to Selecting Alternative Gate Dielectrics
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journal
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March 2002 |
Progress, Challenges, and Opportunities in Two-Dimensional Materials Beyond Graphene
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journal
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March 2013 |
Extreme damping in composite materials with negative-stiffness inclusions
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journal
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March 2001 |
Transient Negative Capacitance Effect in Atomic-Layer-Deposited Al 2 O 3 /Hf 0.3 Zr 0.7 O 2 Bilayer Thin Film
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journal
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February 2019 |
A Gibbs energy view of double hysteresis in ZrO 2 and Si-doped HfO 2
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journal
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October 2020 |
Morphotropic Phase Boundary of Hf 1– x Zr x O 2 Thin Films for Dynamic Random Access Memories
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journal
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November 2018 |
Lanthanum doping induced structural changes and their implications on ferroelectric properties of Hf 1−x Zr x O 2 thin film
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journal
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August 2020 |
Local Structural Heterogeneity and Electromechanical Responses of Ferroelectrics: Learning from Relaxor Ferroelectrics
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journal
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July 2018 |
Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
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journal
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March 2017 |
The era of hyper-scaling in electronics
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journal
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August 2018 |
Three-dimensional integration of nanotechnologies for computing and data storage on a single chip
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journal
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July 2017 |
Composite Materials with Viscoelastic Stiffness Greater Than Diamond
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journal
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February 2007 |
Crystallized HfLaO embedded tetragonal ZrO2 for dynamic random access memory capacitor dielectrics
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journal
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April 2011 |
Direct tunneling leakage current and scalability of alternative gate dielectrics
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journal
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September 2002 |
A comprehensive study on the mechanism of ferroelectric phase formation in hafnia-zirconia nanolaminates and superlattices
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journal
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December 2019 |
Enhanced ferroelectricity in ultrathin films grown directly on silicon
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journal
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April 2020 |
Progress and future prospects of negative capacitance electronics: A materials perspective
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journal
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February 2021 |
Negative Capacitance Transistors
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journal
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January 2019 |
A perspective on semiconductor devices based on fluorite-structured ferroelectrics from the materials–device integration perspective
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journal
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December 2020 |
Engineering of Ferroelectric HfO 2 –ZrO 2 Nanolaminates
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journal
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April 2017 |
Memory leads the way to better computing
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journal
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March 2015 |
Experimental evidence of ferroelectric negative capacitance in nanoscale heterostructures
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journal
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September 2011 |
Negative capacitance in multidomain ferroelectric superlattices
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journal
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June 2016 |
Phase-Field Method of Phase Transitions/Domain Structures in Ferroelectric Thin Films: A Review
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journal
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June 2008 |
Ferroelectric and Dielectric Properties of Hf 0.5 Zr 0.5 O 2 Thin Film Near Morphotropic Phase Boundary
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journal
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February 2021 |
What’s next for negative capacitance electronics?
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journal
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September 2020 |
Trap Generation in IL and HK layers during BTI / TDDB stress in scaled HKMG N and P MOSFETs
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conference
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June 2014 |
Electrical and Reliability Characteristics of FinFETs With High- k Gate Stack and Plasma Treatments
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journal
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January 2021 |
Modeling of Negative Capacitance in Ferroelectric Thin Films
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journal
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June 2019 |
Ferroelectricity in Simple Binary ZrO 2 and HfO 2
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journal
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July 2012 |
Fluorite-structure antiferroelectrics
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journal
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November 2019 |
Structural properties and electronic structure of composite films
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journal
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September 2010 |
Method to Achieve the Morphotropic Phase Boundary in Hf x Zr 1−x O 2 by Electric Field Cycling for DRAM Cell Capacitor Applications
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journal
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April 2021 |
Next generation ferroelectric materials for semiconductor process integration and their applications
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journal
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March 2021 |
Nika : software for two-dimensional data reduction
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journal
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March 2012 |
Recent progress for obtaining the ferroelectric phase in hafnium oxide based films: impact of oxygen and zirconium
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journal
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October 2019 |
Performance and Reliability of TiO 2 /ZrO 2 /TiO 2 (TZT) and AlO-Doped TZT MIM Capacitors
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journal
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October 2016 |
The End of Moore's Law: A New Beginning for Information Technology
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journal
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March 2017 |
Room-Temperature Negative Capacitance in a Ferroelectric–Dielectric Superlattice Heterostructure
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journal
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September 2014 |
Ultrathin EOT high-κ/metal gate devices for future technologies: Challenges, achievements and perspectives (invited)
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journal
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July 2011 |
Spatially resolved steady-state negative capacitance
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journal
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January 2019 |
Growth Window of Ferroelectric Epitaxial Hf 0.5 Zr 0.5 O 2 Thin Films
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journal
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January 2019 |
Nanometre-scale electronics with III–V compound semiconductors
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journal
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November 2011 |
Compositional dependence of crystallization temperatures and phase evolution in hafnia-zirconia (Hf x Zr 1−x )O 2 thin films
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journal
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May 2020 |
Use of Negative Capacitance to Provide Voltage Amplification for Low Power Nanoscale Devices
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journal
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February 2008 |
A monoclinic ferroelectric phase in the Pb(Zr1−xTix)O3 solid solution
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journal
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April 1999 |
High-k Hf x Zr 1-x O₂ Ferroelectric Insulator by Utilizing High Pressure Anneal
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journal
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June 2020 |
Time-Dependent Negative Capacitance Effects in Al 2 O 3 /BaTiO 3 Bilayers
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journal
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June 2016 |
Commentary: The Materials Project: A materials genome approach to accelerating materials innovation
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journal
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July 2013 |
Gate Oxides Beyond SiO 2
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journal
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November 2008 |
Scale-free ferroelectricity induced by flat phonon bands in HfO 2
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journal
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July 2020 |
Variable linear polarization from an X-ray undulator
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journal
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June 2002 |
Experimental Observation of Negative Capacitance in Ferroelectrics at Room Temperature
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journal
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June 2014 |
Ferroelectric negative capacitance
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journal
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March 2019 |
High-throughput computational X-ray absorption spectroscopy
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journal
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July 2018 |
Understanding mobility mechanisms in extremely scaled HfO2 (EOT 0.42 nm) using remote interfacial layer scavenging technique and Vt-tuning dipoles with gate-first process
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conference
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December 2009 |
22nm High-performance SOI technology featuring dual-embedded stressors, Epi-Plate High-K deep-trench embedded DRAM and self-aligned Via 15LM BEOL
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conference
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December 2012 |
The rise of 2D dielectrics/ferroelectrics
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journal
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December 2019 |
Future of dynamic random-access memory as main memory
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journal
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May 2018 |
Phase competition in with applied electric field from first principles
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journal
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December 2020 |
Depolarization as Driving Force in Antiferroelectric Hafnia and Ferroelectric Wake-Up
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journal
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May 2020 |
Piezoelectric response and free-energy instability in the perovskite crystals , , and
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journal
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May 2006 |
Ferroelectricity and Antiferroelectricity of Doped Thin HfO 2 -Based Films
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journal
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February 2015 |
Electric Field-Induced Permittivity Enhancement in Negative-Capacitance FET
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journal
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March 2021 |
Antiferroelectricity in thin-film from first principles
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journal
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October 2014 |
Equivalent Oxide Thickness (EOT) Scaling With Hafnium Zirconium Oxide High-κ Dielectric Near Morphotropic Phase Boundary
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conference
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December 2019 |
The future of ferroelectric field-effect transistor technology
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journal
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October 2020 |
Ferroelectricity in hafnium oxide thin films
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journal
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September 2011 |
Theory of Antiferroelectric Crystals
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journal
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June 1951 |
The origin of ferroelectricity in Hf 1−x Zr x O 2 : A computational investigation and a surface energy model
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journal
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April 2015 |
Intrinsic speed limit of negative capacitance transistors
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journal
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September 2017 |
Development of New TiN/ZrO2/Al2O3/ZrO2/TiN Capacitors Extendable to 45nm Generation DRAMs Replacing HfO2 Based Dielectrics
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conference
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January 2006 |
Monolithic 3D Integration of High Endurance Multi-Bit Ferroelectric FET for Accelerating Compute-In-Memory
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conference
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December 2020 |
Local negative permittivity and topological phase transition in polar skyrmions
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journal
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October 2020 |
Ultimate Scaling of High-κ Gate Dielectrics: Higher-κ or Interfacial Layer Scavenging?
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journal
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March 2012 |
Scalability of TiN/HfAlO/TiN MIM DRAM capacitor to 0.7-nm-EOT and beyond
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conference
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December 2009 |
A thermally robust and thickness independent ferroelectric phase in laminated hafnium zirconium oxide
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journal
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September 2016 |
The effect of interfacial layer properties on the performance of Hf-based gate stack devices
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journal
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November 2006 |
Gate-First Processed FUSI/HfO2/HfSiOx/Si MOSFETs with EOT=0.5 nm - Interfacial Layer Formation by Cycle-by-Cycle Deposition and Annealing
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conference
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December 2007 |