Microfabricated ion trap chip with in situ radio-frequency sensing
Patent
·
OSTI ID:1840238
A radio-frequency (RF) surface ion trap chip includes an RF electrode and an integrated capacitive voltage divider in which an intermediate voltage node is capacitively connected between the RF electrode and a ground. A sensor output trace is connected to the intermediate voltage node.
- Research Organization:
- Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
- Sponsoring Organization:
- USDOE National Nuclear Security Administration (NNSA)
- DOE Contract Number:
- NA0003525
- Assignee:
- National Technology & Engineering Solutions of Sandia, LLC (Albuquerque, NM)
- Patent Number(s):
- 11,056,332
- Application Number:
- 16/821,150
- OSTI ID:
- 1840238
- Resource Relation:
- Patent File Date: 03/17/2020
- Country of Publication:
- United States
- Language:
- English
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