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Title: Nanostructured layer for graded index freeform optics

Patent ·
OSTI ID:1650736

The present disclosure relates to a method for creating an optical component having a spatially controlled refractive index. The method may involve applying a thin metal material layer to a substrate. The thin metal material layer may then be heated to create a mask having a spatially varying nano-particle distribution. The substrate may then be etched, using the mask, to imprint a spatially patterned nanostructure pattern on a surface the substrate.

Research Organization:
Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
Sponsoring Organization:
USDOE
DOE Contract Number:
AC52-07NA27344
Assignee:
Lawrence Livermore National Security, LLC (Livermore, CA)
Patent Number(s):
10,612,145
Application Number:
15/625,258
OSTI ID:
1650736
Resource Relation:
Patent File Date: 06/16/2017
Country of Publication:
United States
Language:
English

References (5)

Methods and Apparatus for the Manufacture of Microstructures patent-application August 2011
Patterned Thin Films by Thermally Induced Mass Displacement patent-application January 2015
Method for Obtaining a Substrate Provided with a Coating Comprising a Discontinuous Thin Metal Layer patent-application July 2016
Nanomaterial Facilitated Laser Transfer patent-application May 2009
Methods of Fabricating Light Emitting Diodes by Masking and Wet Chemical Etching patent-application February 2015