Preparation of asymmetric porous materials

Coker, Eric N.

Title: Preparation of asymmetric porous materials

Patent · Tue Apr 07 00:00:00 EDT 2020

OSTI ID:1650729

Coker, Eric N.

As asymmetric porous film structure formed by depositing a porous material film on a flexible substrate, and applying an anisotropic stress to the porous media on the flexible substrate, where the anisotropic stress results from a stress such as an applied mechanical force, a thermal gradient, and an applied voltage, to form an asymmetric porous material.

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Research Organization:: Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)

Sponsoring Organization:: USDOE

DOE Contract Number:: AC04-94AL85000

Assignee:: National Technology & Engineering Solutions of Sandia, LLC (Albuquerque, NM)

Patent Number(s):: 10,610,822

Application Number:: 14/667,749

OSTI ID:: 1650729

Resource Relation:: Patent File Date: 03/25/2015

Country of Publication:: United States

Language:: English

References (14)

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Method of forming metal matrix composite bodies having complex shapes by a self-generated vacuum process, and products produced therefrom Kantner, Robert C.; Dwivedi, Ratnesh K. https://doi.org/https://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/5163498 US Patent Document 5,163,498	patent	November 1992
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Molecular sieve sensors for selective detection at the nanogram level Bein, Thomas W.; Brown, Kelly D.; Frye, Gregory C. https://doi.org/https://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/5151110 US Patent Document 5,151,110	patent	September 1992
Extruded poly (ethylene oxide) and filler composites and films having enhanced ductility and breathability Wang, James H.; Schertz, David Michael; Soerens, Dave Allen https://doi.org/https://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/6773797 US Patent Document 6,773,797	patent	August 2004
Inorganic Dual-Layer Microporous Supported Membranes Brinker, C. Jeffrey; Tsai, Chung-Yi; Lu, Yunfeng https://doi.org/https://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/20020142172 US Patent Application 10/104551; 20020142172	patent-application	October 2002
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High-Dielectric Constant Thin Film Metal Oxides on Silicon Wafers for Capacitor Applications and Methods of Manufacture Mukherjee, Shyama P.; Phillips, Mark L. F.; Thoms, Travis P. S. https://doi.org/https://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/20080220153 US Patent Application 12/043309; 20080220153	patent-application	September 2008

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