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Title: High energy/power density nickel oxide/hydroxide materials and nickel cobalt oxide/hydroxide materials and production thereof

Patent ·
OSTI ID:1632502

According to one embodiment, a method includes forming a nickel oxide/hydroxide active film onto a substrate from a solution including a nickelous salt and an electrolyte, where the nickel oxide/hydroxide active film has a physical characteristic of maintaining greater than about 80% charge over greater than 500 charge/discharge cycles, and wherein the nickel oxide/hydroxide active film has a physical characteristic of storing electrons at greater than about 0.5 electron per nickel atom.

Research Organization:
Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
Sponsoring Organization:
USDOE
DOE Contract Number:
AC52-07NA27344
Assignee:
Lawrence Livermore National Security, LLC (Livermore, CA)
Patent Number(s):
10,547,046
Application Number:
15/043,226
OSTI ID:
1632502
Resource Relation:
Patent File Date: 02/12/2016
Country of Publication:
United States
Language:
English

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