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Title: The magnetic, electronic, and light-induced topological properties in two-dimensional hexagonal FeX 2 (X = Cl, Br, I) monolayers

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/5.0006446· OSTI ID:1619035
ORCiD logo [1];  [2];  [3]; ORCiD logo [4];  [5]
  1. Collaborative Innovation Center of Quantum Matter, Beijing (China); Peking Univ., Beijing (China); Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States). Center for Nanophase Materials Science (CNMS)
  2. Univ. of Antwerp (Belgium); Hebei Univ. of Technology, Tianjing (China)
  3. Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States). Center for Nanophase Materials Science (CNMS)
  4. Univ. of Antwerp (Belgium)
  5. Collaborative Innovation Center of Quantum Matter, Beijing (China); Peking Univ., Beijing (China); Beijing Academy of Quantum Information Science (China); Chinese Academy of Sciences (CAS), Beijing (China)

Using Floquet–Bloch theory, we propose to realize chiral topological phases in two-dimensional (2D) hexagonal FeX2 (X = Cl, Br, I) monolayers under irradiation of circularly polarized light. Such 2D FeX2 monolayers are predicted to be dynamically stable and exhibit both ferromagnetic and semiconducting properties. To capture the full topological physics of the magnetic semiconductor under periodic driving, we adopt ab initio Wannier-based tight-binding methods for the Floquet–Bloch bands, with the light-induced bandgap closings and openings being obtained as the light field strength increases. The calculations of slabs with open boundaries show the existence of chiral edge states. Interestingly, the topological transitions with branches of chiral edge states changing from zero to one and from one to two by tuning the light amplitude are obtained, showing that the topological Floquet phase of high Chern number can be induced in the present Floquet–Bloch systems.

Research Organization:
Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)
Sponsoring Organization:
USDOE
Grant/Contract Number:
AC05-00OR22725
OSTI ID:
1619035
Alternate ID(s):
OSTI ID: 1617988
Journal Information:
Applied Physics Letters, Vol. 116, Issue 19; ISSN 0003-6951
Publisher:
American Institute of Physics (AIP)Copyright Statement
Country of Publication:
United States
Language:
English
Citation Metrics:
Cited by: 16 works
Citation information provided by
Web of Science

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