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Title: Ultra low noise materials and devices for cryogenic superconductors and quantum bits

Patent ·
OSTI ID:1568461

Materials, devices, methods of use and fabrication thereof are disclosed. The materials are particularly well suited for application in superconducting devices and quantum computing, due to ability to avoid undesirable effects from inherent noise and decoherence. The materials are formed from select isotopes having zero nuclear spin into a single crystal-phase film or layer of thickness depending on the desired application of the resulting device. The film/layer may be suspended or disposed on a substrate. The isotopes may be enriched from naturally-occurring sources of isotopically mixed elemental material(s). The single crystal is preferably devoid of structural defects such as grain boundaries, inclusions, impurities and lattice vacancies. Device configurations may be formed from the layer according to a predetermined pattern using lithographic and/or milling techniques. An optional protective layer may be deposited on some or all of the device to avoid formation of oxides and/or patinas on surfaces of the device.

Research Organization:
Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
Sponsoring Organization:
USDOE
DOE Contract Number:
AC52-07NA27344
Assignee:
Lawrence Livermore National Security, LLC (Livermore, CA)
Patent Number(s):
10,318,880
Application Number:
14/711,718
OSTI ID:
1568461
Resource Relation:
Patent File Date: 05/13/2015
Country of Publication:
United States
Language:
English

References (2)

Isotopically Pure Silicon-on-Insulator Wafers and Method of Making Same patent-application January 2003
Semiconductor Substrate and Method for Fabricating the Same patent-application January 2004

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