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Title: Polishing slurry preventing agglomeration of charged colloids without loss of surface activity

Patent ·
OSTI ID:1568321
; ; ; ; ;

A method for chemically stabilizing polishing slurries in aqueous suspension to prevent their agglomeration while maintaining their surface activity is disclosed. The method prevents the formation of irreversible particle agglomerates during drying and permits the subsequent re-suspension of dried particles with no impact on the particle size distribution. The stabilization method can be customized based on knowledge of the colloid surface charge at suspension pH conditions, addition of a charged species having like charge to the colloid at the suspension conditions, and control of the concentrations of the charged species and other ions in suspension.

Research Organization:
Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
Sponsoring Organization:
USDOE
DOE Contract Number:
AC52-07NA27344
Assignee:
Lawrence Livermore National Security, LLC (Livermore, CA)
Patent Number(s):
10,287,457
Application Number:
14/437,453
OSTI ID:
1568321
Resource Relation:
Patent File Date: 10/16/2013
Country of Publication:
United States
Language:
English

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