Methods and apparatus for forming submicron patterns on films
Patent
·
OSTI ID:1531505
A method for forming a patterned film on a substrate, the method including: providing a first flowable medium on the substrate and a second flowable medium on the first flowable medium, the first and second flowable media having different dielectric properties and defining an interface there between; applying an electric field to the interface for a time sufficient to produce a structure in the first flowable medium along the interface: and hardening the structure in the first flowable medium to form the patterned film.
- Research Organization:
- Univ. Konstanz (Germany); University of Massachusetts, Boston, MA (United States)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- FG02-96ER45612; DMR-9809365
- Assignee:
- Universitat Konstanz (DE); University of Massachusetts (Boston, MA)
- Patent Number(s):
- 7,014,786
- Application Number:
- 10/144,961
- OSTI ID:
- 1531505
- Resource Relation:
- Patent File Date: 2002-05-14
- Country of Publication:
- United States
- Language:
- English
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