Patterning devices using fluorinated compounds
Patent
·
OSTI ID:1531378
A method for producing a spatially patterned structure includes forming a layer of a material on at least a portion of a substructure of the spatially patterned structure, forming a barrier layer of a flourinated material on the layer of material to provide an intermediate structure, and exposing the intermediate structure to at least one of a second material or radiation to cause at least one of a chemical change or a structural change to at least a portion of the intermediate structure. The barrier layer substantially protects the layer of the material from chemical and structural changes during the exposing. Substructures are produced according to this method.
- Research Organization:
- Johns Hopkins Univ., Baltimore, MD (United States)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- FA9550-06-1-0076; FG02-07ER46465
- Assignee:
- The Johns Hopkins University (Baltimore, MD)
- Patent Number(s):
- 10,158,075
- Application Number:
- 15/722,856
- OSTI ID:
- 1531378
- Resource Relation:
- Patent File Date: 2017-10-02
- Country of Publication:
- United States
- Language:
- English
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