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Title: Patterning devices using fluorinated compounds

Patent ·
OSTI ID:1531378

A method for producing a spatially patterned structure includes forming a layer of a material on at least a portion of a substructure of the spatially patterned structure, forming a barrier layer of a flourinated material on the layer of material to provide an intermediate structure, and exposing the intermediate structure to at least one of a second material or radiation to cause at least one of a chemical change or a structural change to at least a portion of the intermediate structure. The barrier layer substantially protects the layer of the material from chemical and structural changes during the exposing. Substructures are produced according to this method.

Research Organization:
Johns Hopkins Univ., Baltimore, MD (United States)
Sponsoring Organization:
USDOE
DOE Contract Number:
FA9550-06-1-0076; FG02-07ER46465
Assignee:
The Johns Hopkins University (Baltimore, MD)
Patent Number(s):
10,158,075
Application Number:
15/722,856
OSTI ID:
1531378
Resource Relation:
Patent File Date: 2017-10-02
Country of Publication:
United States
Language:
English

References (8)

Patterning surfaces with functional polymers journal April 2008
Lateral lubistor structure and method patent February 2007
Method for producing spatially patterned structures using fluorinated compounds patent July 2015
Photolithographic patterning of organic electronic materials journal February 2006
Patterning devices using fluorinated compounds patent October 2017
Flexible active-matrix displays and shift registers based on solution-processed organic transistors journal January 2004
Electric device patent October 1988
Patterning pentacene organic thin film transistors
  • Kymissis, Ioannis; Dimitrakopoulos, Christos D.; Purushothaman, Sampath
  • Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 20, Issue 3 https://doi.org/10.1116/1.1477427
journal January 2002

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