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Title: Repair of Phase Defects in Extreme-Ultraviolet Lithography Mask Blanks

Journal Article · · Published in: Journal of Applied Physics, vol. 96, no. 11, December 1, 2004, pp. 6812-6821
DOI:https://doi.org/10.1063/1.1812826· OSTI ID:15014177
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Research Organization:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
Sponsoring Organization:
USDOE
DOE Contract Number:
W-7405-ENG-48
OSTI ID:
15014177
Report Number(s):
UCRL-JRNL-204491
Journal Information:
Published in: Journal of Applied Physics, vol. 96, no. 11, December 1, 2004, pp. 6812-6821, Journal Name: Published in: Journal of Applied Physics, vol. 96, no. 11, December 1, 2004, pp. 6812-6821
Country of Publication:
United States
Language:
English

References (18)

Ionization dilatation effects in fused silica from 2 to 18‐keV electron irradiation journal September 1974
Method for repairing Mo/Si multilayer thin film phase defects in reticles for extreme ultraviolet lithography journal January 2002
Simulation of repairing thin-film phase defect in masks for EUV lithography conference June 2003
The thermal conductivity of rare‐earth–transition‐metal films as determined by the Wiedemann–Franz law journal June 1990
Effects of radiation on the properties of low thermal expansion coefficient materials: A review journal February 1989
Direct imaging of end-of-range compaction in ion beam irradiated silica waveguides by atomic force microscopy journal June 2000
Practical approach for modeling extreme ultraviolet lithography mask defects
  • Gullikson, E. M.; Cerjan, C.; Stearns, D. G.
  • Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 20, Issue 1 https://doi.org/10.1116/1.1428269
journal January 2002
Elastic Field in a Semi-Infinite Solid due to Thermal Expansion or a Coherently Misfitting Inclusion journal September 2003
An empirical stopping power relationship for low-energy electrons journal January 1989
Densification of fused silica under 193-nm excitation journal January 1997
Advances in low-defect multilayers for EUVL mask blanks
  • Folta, James A.; Davidson, J. Courtney; Larson, Cindy C.
  • SPIE's 27th Annual International Symposium on Microlithography, SPIE Proceedings https://doi.org/10.1117/12.472287
conference July 2002
Developing a viable multilayer coating process for extreme ultraviolet lithography reticles journal January 2004
Photosensitivity in optical fiber waveguides: Application to reflection filter fabrication journal May 1978
Evaluation of the cleanliness of the ion-assisted Mo–Si deposition process for extreme ultraviolet lithography
  • Hau-Riege, Stefan P.; Mirkarimi, Paul B.; Walton, Christopher C.
  • Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 21, Issue 6 https://doi.org/10.1116/1.1615979
journal January 2003
The Radiation Compaction of Vitreous Silica journal November 1968
Ultrasmooth, Conducting Films Composed of Mo/Si Multilayers journal January 1995
Low‐Loss Reflection Coatings Using Absorbing Materials journal May 1972
Silicide layer growth rates in Mo/Si multilayers journal January 1993

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