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Title: UV Laser Conditioning for Reduction of 351-nm Damage Initiation in Fused Silica

Abstract

This paper describes the effect of 355-nm laser conditioning on the concentration of UV-laser-induced surface damage sites on large-aperture fused silica optics. We will show the effect of various 355-nm laser conditioning methodologies on the reduction of surface-damage initiation in fused silica samples that have varying qualities of polishing. With the best, generally available fused silica optic, we have demonstrated that 355-nm laser conditioning can achieve up to 10x reduction in surface damage initiation concentration in the fluence range of 10-14 J/cm{sup 2} (355-nm {at} 3 ns).

Authors:
; ; ; ;
Publication Date:
Research Org.:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
Sponsoring Org.:
US Department of Energy (US)
OSTI Identifier:
15005418
Report Number(s):
UCRL-JC-144300
Journal ID: ISSN 0277-786X; TRN: US200322%%426
DOE Contract Number:  
W-7405-ENG-48
Resource Type:
Conference
Resource Relation:
Journal Volume: 4679; Conference: XXXIII Annual Symposium on Optical Materials for High Power Lasers, Boulder, CO (US), 10/01/2001--10/03/2001; Other Information: PBD: 20 Dec 2001
Country of Publication:
United States
Language:
English
Subject:
71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; LASERS; OPTICS; POLISHING; SILICA

Citation Formats

Brusasco, R M, Penetrante, B M, Peterson, J E, Maricle, S M, and Menapace, J A. UV Laser Conditioning for Reduction of 351-nm Damage Initiation in Fused Silica. United States: N. p., 2001. Web. doi:10.1117/12.461718.
Brusasco, R M, Penetrante, B M, Peterson, J E, Maricle, S M, & Menapace, J A. UV Laser Conditioning for Reduction of 351-nm Damage Initiation in Fused Silica. United States. https://doi.org/10.1117/12.461718
Brusasco, R M, Penetrante, B M, Peterson, J E, Maricle, S M, and Menapace, J A. 2001. "UV Laser Conditioning for Reduction of 351-nm Damage Initiation in Fused Silica". United States. https://doi.org/10.1117/12.461718. https://www.osti.gov/servlets/purl/15005418.
@article{osti_15005418,
title = {UV Laser Conditioning for Reduction of 351-nm Damage Initiation in Fused Silica},
author = {Brusasco, R M and Penetrante, B M and Peterson, J E and Maricle, S M and Menapace, J A},
abstractNote = {This paper describes the effect of 355-nm laser conditioning on the concentration of UV-laser-induced surface damage sites on large-aperture fused silica optics. We will show the effect of various 355-nm laser conditioning methodologies on the reduction of surface-damage initiation in fused silica samples that have varying qualities of polishing. With the best, generally available fused silica optic, we have demonstrated that 355-nm laser conditioning can achieve up to 10x reduction in surface damage initiation concentration in the fluence range of 10-14 J/cm{sup 2} (355-nm {at} 3 ns).},
doi = {10.1117/12.461718},
url = {https://www.osti.gov/biblio/15005418}, journal = {},
issn = {0277-786X},
number = ,
volume = 4679,
place = {United States},
year = {Thu Dec 20 00:00:00 EST 2001},
month = {Thu Dec 20 00:00:00 EST 2001}
}

Conference:
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