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Title: Reaction of LiD with water vapor: thermogravimetric and scanning electron microscopy studies

Abstract

The kinetics of hydroxide film growth on LiD have been studied by the thermogravimetric method in nitrogen saturated with water vapor and by scanning electron microscopy (SEM) of samples that have been exposed to air with 50% relative humidity. The reaction probability is estimated to be 4 x 10{sup -7} for LiD exposed to ambient air with 50% relative humidity, suggesting that the diffusion through the hydroxide film is not the limiting step on the overall process at high moisture levels. The rate of growth is drastically reduced when the temperature is increased to 60 C.

Authors:
; ;
Publication Date:
Research Org.:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
Sponsoring Org.:
US Department of Energy (US)
OSTI Identifier:
15003263
Report Number(s):
UCRL-JC-140651
TRN: US0402525
DOE Contract Number:  
W-7405-ENG-48
Resource Type:
Conference
Resource Relation:
Conference: 23rd Aging, Compatibility and Stockpile Stewardship Conference, Livermore, CA (US), 11/14/2000--11/16/2000; Other Information: PBD: 14 Sep 2000
Country of Publication:
United States
Language:
English
Subject:
37 INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY; LITHIUM DEUTERIDES; WATER VAPOR; CHEMICAL REACTION KINETICS; SCANNING ELECTRON MICROSCOPY; THERMAL GRAVIMETRIC ANALYSIS

Citation Formats

Balooch, M, Dinh, L N, and LeMay, J D. Reaction of LiD with water vapor: thermogravimetric and scanning electron microscopy studies. United States: N. p., 2000. Web.
Balooch, M, Dinh, L N, & LeMay, J D. Reaction of LiD with water vapor: thermogravimetric and scanning electron microscopy studies. United States.
Balooch, M, Dinh, L N, and LeMay, J D. 2000. "Reaction of LiD with water vapor: thermogravimetric and scanning electron microscopy studies". United States. https://www.osti.gov/servlets/purl/15003263.
@article{osti_15003263,
title = {Reaction of LiD with water vapor: thermogravimetric and scanning electron microscopy studies},
author = {Balooch, M and Dinh, L N and LeMay, J D},
abstractNote = {The kinetics of hydroxide film growth on LiD have been studied by the thermogravimetric method in nitrogen saturated with water vapor and by scanning electron microscopy (SEM) of samples that have been exposed to air with 50% relative humidity. The reaction probability is estimated to be 4 x 10{sup -7} for LiD exposed to ambient air with 50% relative humidity, suggesting that the diffusion through the hydroxide film is not the limiting step on the overall process at high moisture levels. The rate of growth is drastically reduced when the temperature is increased to 60 C.},
doi = {},
url = {https://www.osti.gov/biblio/15003263}, journal = {},
number = ,
volume = ,
place = {United States},
year = {Thu Sep 14 00:00:00 EDT 2000},
month = {Thu Sep 14 00:00:00 EDT 2000}
}

Conference:
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