Apparatus for processing materials at high temperatures and pressures
Patent
·
OSTI ID:1496623
An apparatus for processing materials at high temperatures comprises a high strength enclosure; a plurality of high strength radial segments disposed adjacent to and radially inward from the high strength enclosure; a liner disposed adjacent to and radially inward from the radical segments; a chamber defined interior to the liner; a heating device disposed within the chamber; and a capsule disposed within the chamber, the capsule configured to hold a supercritical fluid. The apparatus may be used for growing crystals, e.g., GaN, under high temperature and pressure conditions.
- Research Organization:
- SLT Technologies, Inc., Los Angeles, CA (United States)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- AR000020
- Assignee:
- SLT Technologies, Inc. (Los Angeles, CA)
- Patent Number(s):
- 10,145,021
- Application Number:
- 13/812,757
- OSTI ID:
- 1496623
- Resource Relation:
- Patent File Date: 2011 Jul 28
- Country of Publication:
- United States
- Language:
- English
Reaction vessel
|
patent | February 1984 |
Apparatus for manufacturing semiconductor single crystal
|
patent | August 1986 |
Method of making a crystalline multilayer structure at two pressures the second one lower than first
|
patent | June 1997 |
Apparatus for processing materials in supercritical fluids and methods thereof
|
patent | April 2010 |
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