Silicone elastomers capable of large isotropic dimensional change
Patent
·
OSTI ID:1495338
Described herein is a highly effective route towards the controlled and isotropic reduction in size-scale, of complex 3D structures using silicone network polymer chemistry. In particular, a class of silicone structures were developed that once patterned and cured can `shrink` micron scale additive manufactured and lithographically patterned structures by as much as 1 order of magnitude while preserving the dimensions and integrity of these parts. This class of silicone materials is compatible with existing additive manufacture and soft lithographic fabrication processes and will allow access to a hitherto unobtainable dimensionality of fabrication.
- Research Organization:
- Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- AC52-07NA27344
- Assignee:
- Lawrence Livermore National Security, LLC (Livermore, CA)
- Patent Number(s):
- 10,138,330
- Application Number:
- 15/584,711
- OSTI ID:
- 1495338
- Resource Relation:
- Patent File Date: 2017 May 02
- Country of Publication:
- United States
- Language:
- English
Similar Records
Silicone elastomers capable of large isotropic dimensional change
Fabrication of Pt-Si Schottky diodes using soft lithographic patterning and selective chemical vapor deposition
Design Fabrication and Characterization of High Density Silicon Photonic Components
Patent
·
Tue Jul 18 00:00:00 EDT 2017
·
OSTI ID:1495338
Fabrication of Pt-Si Schottky diodes using soft lithographic patterning and selective chemical vapor deposition
Journal Article
·
Tue Mar 16 00:00:00 EST 1999
· Langmuir
·
OSTI ID:1495338
Design Fabrication and Characterization of High Density Silicon Photonic Components
Thesis/Dissertation
·
Sun Feb 01 00:00:00 EST 2015
·
OSTI ID:1495338