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Title: Phosphorus incorporation for n-type doping of diamond with (100) and related surface orientation

Patent ·
OSTI ID:1492817

Apparatuses and methods are provided for manufacturing diamond electronic devices. The method includes at least one of the following acts: positioning a substrate in a plasma enhanced chemical vapor deposition (PECVD) reactor; controlling temperature of the substrate by manipulating microwave power, chamber pressure, and gas flow rates of the PECVD reactor; and growing phosphorus doped diamond layer on the substrate using a pulsed deposition comprising a growth cycle and a cooling cycle.

Research Organization:
ARIZONA BOARD OF REGENTS ON BEHALF OF ARIZONA STATE UNIVERSITY, Scottsdale, AZ (United States)
Sponsoring Organization:
USDOE
DOE Contract Number:
AR0000453
Assignee:
ARIZONA BOARD OF REGENTS ON BEHALF OF ARIZONA STATE UNIVERSITY (Scottsdale, AZ)
Patent Number(s):
10,121,657
Application Number:
15/151,295
OSTI ID:
1492817
Resource Relation:
Patent File Date: 2016 May 10
Country of Publication:
United States
Language:
English

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