Phosphorus incorporation for n-type doping of diamond with (100) and related surface orientation
Patent
·
OSTI ID:1492817
Apparatuses and methods are provided for manufacturing diamond electronic devices. The method includes at least one of the following acts: positioning a substrate in a plasma enhanced chemical vapor deposition (PECVD) reactor; controlling temperature of the substrate by manipulating microwave power, chamber pressure, and gas flow rates of the PECVD reactor; and growing phosphorus doped diamond layer on the substrate using a pulsed deposition comprising a growth cycle and a cooling cycle.
- Research Organization:
- ARIZONA BOARD OF REGENTS ON BEHALF OF ARIZONA STATE UNIVERSITY, Scottsdale, AZ (United States)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- AR0000453
- Assignee:
- ARIZONA BOARD OF REGENTS ON BEHALF OF ARIZONA STATE UNIVERSITY (Scottsdale, AZ)
- Patent Number(s):
- 10,121,657
- Application Number:
- 15/151,295
- OSTI ID:
- 1492817
- Resource Relation:
- Patent File Date: 2016 May 10
- Country of Publication:
- United States
- Language:
- English
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