Large Aperture and Wedged Multilayer Laue Lens for X-ray Nanofocusing

Journal Article · Tue Jan 01 00:00:00 EST 2019 · Journal of Nanoscience and Nanotechnology

DOI:https://doi.org/10.1166/jnn.2019.16479· OSTI ID:1482362

Bouet, Nathalie ^[1]; Macrander, Albert T. ^[2]; Maser, Jörg ^[2]; Chu, Yong S. ^[1]; Zhou, Juan ^[1]; Nazaretski, Evgeny ^[1]; Yan, Hanfei ^[1]; Huang, Xiaojing ^[1]; Conley, Ray ^[1]

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1. Brookhaven National Lab. (BNL), Upton, NY (United States)
2. Argonne National Lab. (ANL), Argonne, IL (United States)

Diffraction optics fabricated from multilayers offer an intriguing alternative to lithography-based zone plates due to their advantages of virtually limitless aspect ratio and extremely small feature size. However, other issues, intrinsic to thin-film deposition, such as film stress and deposition rate instability, for example, limit the total achievable aperture. Over the last decade, Multilayer Laue Lens (MLLs) have progressed from a mere curiosity with initial aperture sizes in the 3-10 μm range, to real beamline-deployed optics with apertures in the 40-50 μm range1-3. By optimizing deposition conditions and incorporating new materials, MLLs have now broken the 100 μm thickness milestone. A flat WSi2/Al-Si MLL with a deposition thickness of 102 μm, the largest MLL to date, is reviewed. New large aperture wedged MLLs (wMLL), which were first fabricated by APS in 2006 using the WSi2/Si material system, are presented which demonstrate high focusing efficiency across a broad energy range. These results confirm findings by other groups who have also independently fabricated wMLL4, 5 based on a similar material system.

• Research Organization: Brookhaven National Lab. (BNL), Upton, NY (United States); Argonne National Lab. (ANL), Argonne, IL (United States)
• Sponsoring Organization: USDOE Office of Science (SC), Basic Energy Sciences (BES)
• Grant/Contract Number: SC0012704; AC02-06CH11357
• OSTI ID: 1482362
• Alternate ID(s): OSTI ID: 1491808
• Report Number(s): BNL-209449-2018-JAAM
• Journal Information: Journal of Nanoscience and Nanotechnology, Vol. 19, Issue 1; ISSN 1533-4880
• Publisher: American Scientific Publishers
• Country of Publication: United States
• Language: English

Related Subjects

47 OTHER INSTRUMENTATION
Al–Si
MLL
Multilayer
Multilayer Laue Lens
Nanofocusing
WSi2/Si
X-ray Optics
Multilayer
x-ray optics
Multilayer Laue Lens
MLL
Nanofocusing
WSi2/Si
Al-Si