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Title: Realization of a Hole-Doped Mott Insulator on a Triangular Silicon Lattice

Journal Article · · Physical Review Letters
 [1];  [2];  [1];  [1];  [2];  [3];  [4];  [5];  [1]
  1. Univ. of Tennessee, Knoxville, TN (United States). Dept. of Physics and Astronomy
  2. Univ. of Tennessee, Knoxville, TN (United States). Dept. of Physics and Astronomy. Joint Inst. of Advanced Materials
  3. Inha Univ., Incheon (Korea, Republic of). Dept. of Physics
  4. Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States). Computational Science and Engineering Division. Center for Nanophase Materials Sciences
  5. Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States). Materials Science and Technology Division; Univ. of Tennessee, Knoxville, TN (United States). Dept. of Physics and Astronomy

The physics of doped Mott insulators is at the heart of some of the most exotic physical phenomena in materials research including insulator-metal transitions, colossal magnetoresistance, and high-temperature superconductivity in layered perovskite compounds. Advances in this field would greatly benefit from the availability of new material systems with a similar richness of physical phenomena but with fewer chemical and structural complications in comparison to oxides. In this paper, using scanning tunneling microscopy and spectroscopy, we show that such a system can be realized on a silicon platform. The adsorption of one-third monolayer of Sn atoms on a Si(111) surface produces a triangular surface lattice with half filled dangling bond orbitals. Modulation hole doping of these dangling bonds unveils clear hallmarks of Mott physics, such as spectral weight transfer and the formation of quasiparticle states at the Fermi level, well-defined Fermi contour segments, and a sharp singularity in the density of states. These observations are remarkably similar to those made in complex oxide materials, including high-temperature superconductors, but highly extraordinary within the realm of conventional $sp$-bonded semiconductor materials. Finally, it suggests that exotic quantum matter phases can be realized and engineered on silicon-based materials platforms.

Research Organization:
Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States); Univ. of Tennessee, Knoxville, TN (United States); Inha University, Incheon (Korea, Republic of)
Sponsoring Organization:
USDOE; ORNL Laboratory Directed Research and Development (LDRD) Program; UT-ORNL Joint Directed Research and Development (JDRD) Program; National Science Foundation (NSF); National Research Foundation of Korea (NRF); Ministry of Science, ICT and Future Planning (MSIP) of Korea
Grant/Contract Number:
AC05-00OR22725; DMR 1410265; NRF-2017R1A2B2003928
OSTI ID:
1471877
Alternate ID(s):
OSTI ID: 1414990
Journal Information:
Physical Review Letters, Vol. 119, Issue 26; ISSN 0031-9007
Publisher:
American Physical Society (APS)Copyright Statement
Country of Publication:
United States
Language:
English
Citation Metrics:
Cited by: 25 works
Citation information provided by
Web of Science

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Cited By (2)

The Mott to Kondo transition in diluted Kondo superlattices journal May 2019
Atomic and electronic structure of doped Si ( 111 ) ( 2 3 × 2 3 ) R 30 -Sn interfaces journal May 2018