Soft X-Ray Reflection Optics for X-Ray Projection Lithography Final Report CRADA No. TC-0191/0192-92

Technical Report · Thu Mar 15 00:00:00 EDT 2018

DOI:https://doi.org/10.2172/1432981· OSTI ID:1432981

Kania, Don ^[1]; Salvador, Jack ^[2]; Markle, David ^[3]; Foster, Richard ^[4]

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1. Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
2. Intel Corp., Santa Clara, CA (United States)
3. Ultratech Stepper, San Jose, CA (United States)
4. JAMAR Technology Co., San Diego, CA (United States)

Develop a compact and efficient x-ray illumination system (i.e., a "front end") for a practical soft­ x-ray projection lithography (SXPL) exposure tool.

• Research Organization: Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
• Sponsoring Organization: USDOE
• DOE Contract Number: AC52-07NA27344
• OSTI ID: 1432981
• Report Number(s): LLNL-TR-748705; UCRL-ID-138676
• Country of Publication: United States
• Language: English

Related Subjects

70 PLASMA PHYSICS AND FUSION
71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS