Calcium impurity as a source of non-radiative recombination in (In,Ga)N layers grown by molecular beam epitaxy
- Univ. of California, Santa Barbara, CA (United States). Materials Dept.
- Univ. of California, Santa Barbara, CA (United States). Materials Dept.; Swiss Federal Inst. of Technology (EPFL), Lausanne (Switzerland). Inst. of Physics
Ca as an unintentional impurity has been investigated in III-nitride layers grown by molecular beam epitaxy (MBE). It is found that Ca originates from the substrate surface, even if careful cleaning and rinsing procedures are applied. The initial Ca surface coverage is similar to 10(12) cm(-2), which is consistent with previous reports on GaAs and silicon wafers. At the onset of growth, the Ca species segregates at the growth front while incorporating at low levels. The incorporation rate is strongly temperature dependent. It is about 0.03% at 820 degrees C and increases by two orders of magnitude when the temperature is reduced to 600 degrees C, which is the typical growth temperature for InGaN alloy. Consequently, [Ca] is as high as 10(18) cm(-3) in InGaN/GaN quantum well structures. Such a huge concentration might be detrimental for the efficiency of light emitting diodes (LEDs) if one considers that Ca is potentially a source of Shockley-Read-Hall (SRH) defects. We thus developed a specific growth strategy to reduce [Ca] in the MBE grown LEDs, which consisted of burying Ca in a low temperature InGaN/GaN superlattice (SL) before the growth of the active region. Finally, two LED samples with and without an SL were fabricated. An increase in the output power by one order of magnitude was achieved when Ca was reduced in the LED active region, providing evidence for the role of Ca in the SRH recombination.
- Research Organization:
- Univ. of California, Santa Barbara, CA (United States)
- Sponsoring Organization:
- USDOE Office of Energy Efficiency and Renewable Energy (EERE), Energy Efficiency Office. Building Technologies Office; King Abdulaziz City for Science and Technology, Riyadh (Saudi Arabia); King Abdullah Univ. of Science and Technology, Thuwal (Saudi Arabia)
- Grant/Contract Number:
- EE0007096
- OSTI ID:
- 1429096
- Alternate ID(s):
- OSTI ID: 1333348; OSTI ID: 1635246
- Journal Information:
- Applied Physics Letters, Vol. 109, Issue 21; ISSN 0003-6951
- Publisher:
- American Institute of Physics (AIP)Copyright Statement
- Country of Publication:
- United States
- Language:
- English
Web of Science
Luminescent N-polar (In,Ga)N/GaN quantum wells achieved by plasma-assisted molecular beam epitaxy at temperatures exceeding 700 °C
|
journal | January 2018 |
GaN surface as the source of non-radiative defects in InGaN/GaN quantum wells
|
journal | September 2018 |
Evidence of trap-assisted Auger recombination in low radiative efficiency MBE-grown III-nitride LEDs
|
journal | November 2019 |
Recombination dynamics in GaInN/GaN quantum wells
|
journal | June 2019 |
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Related Subjects
SUPERCONDUCTIVITY AND SUPERFLUIDITY
37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY
Condensed matter properties
mass spectrometry
light emitting diodes
surface and interface chemistry
chemical analysis
semiconductors
III-V semiconductors
quantum wells
surface treatments
thin film deposition
semiconductor materials
epitaxy
electroluminescence
lasers
superlattices
crystallography
materials treatment
36 MATERIALS SCIENCE
light emitting diodes
solid state lighting