Atomic layer deposition frequency-multiplied Fresnel zone plates for hard x-rays focusing

Journal Article · Fri Dec 01 00:00:00 EST 2017 · Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films

DOI:https://doi.org/10.1116/1.5003412· OSTI ID:1427467

Moldovan, Nicolaie ^[1]; Divan, Ralu ^[2]; Zeng, Hongjun ^[1]; Ocola, Leonidas E. ^[2]; De Andrade, Vincent ^[2]; Wojcik, Michael ^[2]

---

1. Advanced Diamond Technologies, Inc., Romeoville, IL (United States)
2. Argonne National Lab. (ANL), Argonne, IL (United States)

The design and fabrication of Fresnel zone plates for hard x-ray focusing up to 25 keV photon energies with better than 50 nm imaging half-pitch resolution is reported as performed by forming an ultrananocrystalline diamond (UNCD) scaffold, subsequently coating it with atomic layer deposition (ALD) with an absorber/phase shifting material, followed by back side etching of Si to form a diamond membrane device. The scaffold is formed by chemical vapor-deposited UNCD, electron beam lithography, and deep-reactive ion etching of diamond to desired specifications. The benefits of using diamond are as follows: improved mechanical robustness to prevent collapse of high-aspect-ratio ring structures, a known high-aspect-ratio etch method, excellent radiation hardness, extremely low x-ray absorption, and significantly improved thermal/dimensional stability as compared to alternative materials. Central to the technology is the high-resolution patterning of diamond membranes at wafer scale, which was pushed to 60 nm lines and spaces etched 2.2-mu m-deep, to an aspect ratio of 36:1. The absorber growth was achieved by ALD of Ir, Pt, or W, while wafer-level processing allowed to obtain up to 121 device chips per 4 in. wafer with yields better than 60%. X-ray tests with such zone plates allowed resolving 50 nm lines and spaces, at the limit of the available resolution test structures.

• Research Organization: Argonne National Lab. (ANL), Argonne, IL (United States)
• Sponsoring Organization: USDOE Office of Science - Small Business Innovation Research (SBIR) and Small Business Technology Transfer (STTR); National Science Foundation (NSF); USDOE Office of Science (SC), Basic Energy Sciences (BES). Scientific User Facilities Division
• Grant/Contract Number: AC02-06CH11357; No. DE-AC02-06CH11357; SC0011265
• OSTI ID: 1427467
• Alternate ID(s): OSTI ID: 1415155
• Journal Information: Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films, Vol. 36, Issue 1; ISSN 0734-2101
• Publisher: American Vacuum Society
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE